Published August 2008 | Version v1
Journal article

The etching of alpha-recoil tracks in phlogopite

  • 1. State Key Laboratory of Geological Processes and Mineral Resources, China University of Geosciences, Beijing 100083 (China)
  • 2. Laboratory of Nuclear Analysis Techniques, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100039 (China)
  • 3. Taiyuan University of Technology, Taiyuan 030024 (China)

Description

This work uses three phlogopite samples to investigate the etching behavior of alpha-recoil tracks (α-recoil tracks), which is a key problem in dating procedures. At the initial stage of the etching process, the number of alpha-recoil tracks increased linearly with etching time, then the linearity was interrupted due to the overlapping of alpha-recoil tracks. The slope of the etching line could be similar and also could be different both in the same sample and in different samples. It is shown that the etching time could vary with different contents of U and Th and could not exceed 200 min in 4% HF acid at 25±10C in order to get a satisfactory etching line and to calculate the exact density. We propose two valid methods that can accurately determine the position of the sample's surface and may reduce the alpha-recoil track dating errors

Availability note (English)

Available from http://dx.doi.org/10.1016/j.radmeas.2008.04.049

Additional details

Identifiers

DOI
10.1016/j.radmeas.2008.04.049;
PII
S1350-4487(08)00221-7;

Publishing Information

Journal Title
Radiation Measurements
Journal Volume
43
Journal Issue
suppl.1
Journal Page Range
p. S353-S356
ISSN
1350-4487
CODEN
RMEAEP

Conference

Title
23. international conference on nuclear tracks in solids
Dates
11-15 Sep 2006
Place
Beijing (China)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
40008308
Subject category
S58: GEOSCIENCES;
Resource subtype / Literary indicator
Conference
Descriptors DEI
AGE ESTIMATION; DENSITY; ERRORS; ETCHING; HYDROFLUORIC ACID; PARTICLE TRACKS; RECOILS
Descriptors DEC
FLUORINE COMPOUNDS; HALOGEN COMPOUNDS; HYDROGEN COMPOUNDS; INORGANIC ACIDS; INORGANIC COMPOUNDS; PHYSICAL PROPERTIES; SURFACE FINISHING

Optional Information

Copyright
Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.