Published October 21, 2008 | Version v1
Journal article

Effect of low-frequency power on dual-frequency capacitively coupled plasmas

  • 1. Department of Physics, Soochow University, Suzhou 215006 (China)
  • 2. SiChuan University of Science and Engineering, ZiGong 643000 (China)

Description

In low-pressure dual-frequency capacitively coupled plasmas driven with 60/13.56 MHz, the effect of low-frequency power on the plasma characteristics was investigated using a compensated Langmuir electrostatic probe. At lower pressures (about 10 mTorr), it was possible to control the plasma density and the ion bombardment energy independently. As the pressure increased, this independent control could not be achieved. As the low-frequency power increased for the fixed high-frequency power, the electron energy probability function (EEPF) changed from Druyvesteyn-like to Maxwellian-like at pressures of 50 mTorr and higher, along with a drop in electron temperature. The plasma parameters were calculated and compared with simulation results.

Availability note (English)

Available from http://dx.doi.org/10.1088/0022-3727/41/20/205209

Additional details

Identifiers

DOI
10.1088/0022-3727/41/20/205209;
PII
S0022-3727(08)87843-6;

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
41
Journal Issue
20
Journal Page Range
[6 p.]
ISSN
0022-3727
CODEN
JPAPBE

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
41017734
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
ELECTRON TEMPERATURE; ELECTRONS; ELECTROSTATIC PROBES; ION BEAMS; MHZ RANGE 01-100; PLASMA; PLASMA DENSITY; PROBABILITY; SIMULATION
Descriptors DEC
BEAMS; ELEMENTARY PARTICLES; FERMIONS; FREQUENCY RANGE; LEPTONS; MHZ RANGE; PROBES