High energy x-ray diffraction
Creators
- 1. European Synchrotron Radiation Facility, B.P. 220, F-38043 Grenoble Cedex (France)
Description
The fundamental scattering process of x-rays of energies around 10 keV is governed by absorption for most atomic species. This has led to the development of several experimental techniques based on the discontinuous character of x-ray absorption, such as multi-wavelength anomalous diffraction, anomalous diffuse scattering including small-angle scattering, and absorption spectroscopy (EXAFS, SEXAFS, XANES). This paper shows the various contributions to the total scattering cross-section as a function of photon energy for two examples: carbon and lead. For carbon there is a cross-over of the coherent and the photoelectric cross-section at about 40 keV whereas for lead photoabsorption is always much stronger than coherent scattering, even in the range from 100 keV to 1 MeV. In both cases the level of Compton scattering is comparable. Fortunately, Bragg-scattering or diffraction gives rise to an enhancement of the elastic coherent scattering such that diffraction or extinction effects can be much stronger than absorption. High energy x-ray diffraction aims at minimizing absorption effects so that the true scattering effects of x-rays by crystalline matter are predominant. One consequence is that the bulk of materials rather than the surface is studied thus overcoming what is often considered to be a disadvantage of x-ray techniques as compared to e.g., neutron scattering: the strongly limited penetration depth. But there are also other interesting advantages which will be pointed out in this paper. Scattering theories for perfect and non-perfect (mosaic) crystals can be found in standard textbooks, for instance by Zachariasen. In the following sections only some essential, basic features will be recalled
Additional details
Publishing Information
- Publisher
- SPIE Society of Photo-Optical Instrumentation Engineers.
- Imprint Place
- Bellingham, WA (United States)
- ISBN
- 0-8194-0406-3
- Imprint Title
- Advanced x-ray/EUV radiation sources and applications
- Imprint Pagination
- 292 p.
- Journal Page Range
- p. 234-244.
Conference
- Title
- 34. Society of Photo-Optical Instrumentation Engineers (SPIE) annual international technical symposium on optical and optoelectronic applied science and engineering.
- Dates
- 8-13 Jul 1990.
- Place
- San Diego, CA (United States).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 23053985
- Subject category
- S07: ISOTOPES AND RADIATION SOURCES; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ABSORPTION SPECTROSCOPY; BRAGG CURVE; CARBON; COHERENT SCATTERING; CROSS SECTIONS; CRYSTAL LATTICES; KEV RANGE 01-10; LEAD; PERFORMANCE; PHOTON BEAMS; SMALL ANGLE SCATTERING; X-RAY DIFFRACTION; X-RAY DIFFRACTOMETERS
- Descriptors DEC
- BEAMS; CRYSTAL STRUCTURE; DIAGRAMS; DIFFRACTION; DIFFRACTOMETERS; ELEMENTS; ENERGY RANGE; INFORMATION; KEV RANGE; MEASURING INSTRUMENTS; METALS; NONMETALS; SCATTERING; SPECTROSCOPY
Optional Information
- Secondary number(s)
- CONF-900756--.