Published 1990 | Version v1
Book

High energy x-ray diffraction

Creators

  • 1. European Synchrotron Radiation Facility, B.P. 220, F-38043 Grenoble Cedex (France)

Description

The fundamental scattering process of x-rays of energies around 10 keV is governed by absorption for most atomic species. This has led to the development of several experimental techniques based on the discontinuous character of x-ray absorption, such as multi-wavelength anomalous diffraction, anomalous diffuse scattering including small-angle scattering, and absorption spectroscopy (EXAFS, SEXAFS, XANES). This paper shows the various contributions to the total scattering cross-section as a function of photon energy for two examples: carbon and lead. For carbon there is a cross-over of the coherent and the photoelectric cross-section at about 40 keV whereas for lead photoabsorption is always much stronger than coherent scattering, even in the range from 100 keV to 1 MeV. In both cases the level of Compton scattering is comparable. Fortunately, Bragg-scattering or diffraction gives rise to an enhancement of the elastic coherent scattering such that diffraction or extinction effects can be much stronger than absorption. High energy x-ray diffraction aims at minimizing absorption effects so that the true scattering effects of x-rays by crystalline matter are predominant. One consequence is that the bulk of materials rather than the surface is studied thus overcoming what is often considered to be a disadvantage of x-ray techniques as compared to e.g., neutron scattering: the strongly limited penetration depth. But there are also other interesting advantages which will be pointed out in this paper. Scattering theories for perfect and non-perfect (mosaic) crystals can be found in standard textbooks, for instance by Zachariasen. In the following sections only some essential, basic features will be recalled

Additional details

Publishing Information

Publisher
SPIE Society of Photo-Optical Instrumentation Engineers.
Imprint Place
Bellingham, WA (United States)
ISBN
0-8194-0406-3
Imprint Title
Advanced x-ray/EUV radiation sources and applications
Imprint Pagination
292 p.
Journal Page Range
p. 234-244.

Conference

Title
34. Society of Photo-Optical Instrumentation Engineers (SPIE) annual international technical symposium on optical and optoelectronic applied science and engineering.
Dates
8-13 Jul 1990.
Place
San Diego, CA (United States).

Optional Information

Secondary number(s)
CONF-900756--.