Published September 30, 2016 | Version v1
Journal article

Design and synthesis of amorphous SiOx structures generated by Sn quantum dots: growth mechanism and luminescent origin

  • 1. School of Mechanical Engineering, Konkuk University, Seoul 143-701 (Korea, Republic of)
  • 2. Inha Analytical Instrumentation Center, Inha University, Incheon 402-751 (Korea, Republic of)
  • 3. Sensor System Research Center, Korea Institute of Science and Technology, Seoul 136-791 (Korea, Republic of)
  • 4. Department of Materials Science and Engineering, Inha University, Incheon 402-751 (Korea, Republic of)
  • 5. Helmut-Fischer Korea, 462, Dogok-ro, Songpa-gu, Seoul 05574 (Korea, Republic of)

Description

SiOx structures with different diameters of a few hundreds of nanometers and/or a few micrometers are prepared using applied thermal evaporation. Subsequently, Sn quantum dot-based SiOx architectures are synthesized via the continuous steps of the carbothermal reduction of SnO2, substitution of Sn4+ for In3+, thermal oxidation of Si, Sn sublimation, interfacial reaction, and diffusion reaction consistent with corresponding phase equilibriums. Several crystalline and spherical-shaped Sn quantum dots with diameters between 2 and 7 nm are observed in the amorphous SiOx structures. The morphological evolution, including hollow Sn (or SnOx) sphere and wire-like, worm-like, tube-like, and flower-like SiOx, occurs stepwise on the Si substrate upon increasing the given process energies. The optical characteristics based on confocal measurements reveal the as-synthesized SiOx structures, irrespective of whether crystallinity is formed, which all have visible-range emissions originating from the numerous different-sized and -shaped Sn quantum dots permeating into the SiOx matrix. In addition, photoluminescence emissions ranging between ultraviolet and red regions are in agreement with confocal measurements. The origins of the morphology- and luminescence-controlled amorphous SiOx with Sn quantum dots are also discussed. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/27/39/395602

Additional details

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
27
Journal Issue
39
Journal Page Range
[9 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
50039369
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
DIFFUSION; EQUILIBRIUM; NANOWIRES; PHOTOLUMINESCENCE; QUANTUM DOTS; SILICON OXIDES; SPHERES; SUBSTRATES; SYNTHESIS; TIN OXIDES; ULTRAVIOLET RADIATION
Descriptors DEC
CHALCOGENIDES; ELECTROMAGNETIC RADIATION; EMISSION; LUMINESCENCE; NANOSTRUCTURES; OXIDES; OXYGEN COMPOUNDS; PHOTON EMISSION; RADIATIONS; SILICON COMPOUNDS; TIN COMPOUNDS