Published June 8, 2005 | Version v1
Journal article

Impact of the size 4 cluster on low temperature indium diffusion in silicon

  • 1. Emerging Technologies Research Centre, De Montfort University, Leicester LE1 9BH (United Kingdom)
  • 2. Silicon Technology Development, Texas Instruments, Dallas, TX 75243 (United States)

Description

Using ab initio density functional theory the configuration space of indium clusters in silicon up to size 4 is explored. The strongest binding energy corresponds to a cluster containing one indium and three self-interstitials. Two plausible configurations almost degenerate in energy are found: the <100> I4 model and an alternative which combines two <110> split di-interstitials. The segregation of indium to a InI4 cluster is found to capture the dual peak and the low temperature annealing behaviour of indium

Availability note (English)

Available online at http://stacks.iop.org/0953-8984/17/S2165/cm5_22_003.pdf or at the Web site for the Journal of Physics. Condensed Matter (ISSN 1361-648X) http://www.iop.org/

Additional details

Publishing Information

Journal Title
Journal of Physics. Condensed Matter
Journal Volume
17
Journal Issue
22
Journal Page Range
p. S2165-S2170
ISSN
0953-8984
CODEN
JCOMEL

Conference

Title
1. international workshop on coordination action on defects relevant to engineering silicon-based devices (CADRES)
Dates
26-28 Sep 2004
Place
Catania, Sicily (Italy)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
36104244
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ANNEALING; ATOMIC CLUSTERS; BINDING ENERGY; CAPTURE; DENSITY FUNCTIONAL METHOD; DIFFUSION; INDIUM; INTERSTITIALS; SEGREGATION; SILICON; TEMPERATURE DEPENDENCE
Descriptors DEC
CALCULATION METHODS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELEMENTS; ENERGY; HEAT TREATMENTS; METALS; POINT DEFECTS; SEMIMETALS; VARIATIONAL METHODS