Published October 30, 2012 | Version v1
Journal article

Optical wave microphone measurement during laser ablation of Si

  • 1. Graduate School of Science and Technology, Kumamoto University, 2-39-1 Kurokami, Kumamoto, 860-8555 (Japan)
  • 2. Graduate School of Industrial Engineering, Tokai University, 9-1-1 Toroku, Kumamoto, 862-8652 (Japan)

Description

Pulsed laser irradiation is used for surface treatment of a solid and ablation for particle formation in gas, liquid or supercritical phase media. When a pulsed laser is used to irradiate a solid, spatial refractive index variations (including photothermal expansion, shockwaves and particles) occur, which vary depending on the energy density of the pulsed laser. We focused on this phenomenon and applied an unique method for detection of refractive index variation using an optical wave microphone based on Fraunhofer diffraction. In this research, we analyzed the waveforms and frequencies of refractive index variations caused by pulsed laser irradiation of silicon in air and measured with an optical wave microphone.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2012.02.028

Additional details

Identifiers

DOI
10.1016/j.tsf.2012.02.028;
PII
S0040-6090(12)00156-3;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
521
Journal Page Range
p. 132-136
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
3. international conference on microelectronics and plasma technology
Acronym
ICMAP2011
Dates
4-7 Jul 2011
Place
Dalian (China)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
44103659
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ABLATION; DIFFRACTION; ENERGY DENSITY; LASER RADIATION; REFRACTIVE INDEX; SHOCK WAVES; SILICON; SURFACE TREATMENTS; WAVE FORMS
Descriptors DEC
COHERENT SCATTERING; ELECTROMAGNETIC RADIATION; ELEMENTS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; RADIATIONS; SCATTERING; SEMIMETALS

Optional Information

Copyright
Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.