Published 1990 | Version v1
Book

Sheath voltage ratio for asymmetric RF discharges

  • 1. California Univ., Berkeley, CA (USA)

Description

Spherical and cylindrical many-particle models are being used to simulate RF discharges in which the RF powered and the grounded electrodes have different areas. This asymmetry determines the magnitude of the self-bias voltage Va (the ion bombarding energy) at the powered electrode, which is a critical process parameter. Recent analytical models for the sheath voltage ratio including the effect of the floating potential have been developed that agree with some experimental results. One dimensional (radial) spherical shell models have also been developed, incorporating various assumptions for the sheath and the glow discharges, leading to a scaling which is in agreement with some measurements. The authors simulated the spherical model with a non uniform ionization and the results agree with the theory. The cylindrical simulation shows that the floating potential plays an important role. The simulation results will be given graphically as the sheath voltage ratio versus area ratio, and will be compared with the theory. The simulation codes are PDC1 (cylindrical) and PDS1 (spherical) which utilize particle-in-cell techniques plus Monte-Carlo simulation of electron-neutral (elastic, excitation and ionization) and ion-neutral (scattering and charge-exchange) collisions

Additional details

Publishing Information

Publisher
IEEE Service Center.
Imprint Place
Piscataway, NJ (USA)
Imprint Title
1990 IEEE international conference on plasma science-Conference Record-Abstracts
Imprint Pagination
231 p.
Journal Page Range
p. 184.

Conference

Title
17. IEEE international conference on plasma science (ICOPS 17).
Dates
21-23 May 1990.
Place
Oakland, CA (USA).

Optional Information

Secondary number(s)
CONF-900585--.