Published April 1, 2006
| Version v1
Journal article
Fabrication of Nanoimprint stamps for photonic crystals
- 1. BESSY GmbH, Anwenderzentrum fuer Mikrotechnik, Albert-Einstein-Str. 15, 12489 Berlin (Germany)
- 2. Micro resist technology GmbH, Koepenicker Str. 325, 12555 Berlin (Germany)
Description
We report on fabrication of nanoimprint stamps for fabrication of two dimensional photonic crystals in visible range of spectra. Nanoimprint stamps made of silicon and/or nickel were successfully fabricated using electron beam lithography and advanced dry etching techniques. The quality of the stamps was evaluated using scanning electron microscopy. The fabricated stamps were also evaluated by imprinting them into suitable polymer materials
Availability note (English)
Available online at http://stacks.iop.org/1742-6596/34/897/jpconf6_34_149.pdf or at the Web site for the Journal of Physics. Conference Series (Online) (ISSN 1742-6596) http://www.iop.org/Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. Conference Series (Online)
- Journal Volume
- 34
- Journal Issue
- 1
- Journal Page Range
- p. 897-903
- ISSN
- 1742-6596
Conference
- Title
- International MEMS conference 2006
- Acronym
- iMEMS2006
- Dates
- 9-12 May 2006
- Place
- Singapore (Singapore)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37058619
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CRYSTALS; ELECTRON BEAMS; ELECTRONIC STRUCTURE; ETCHING; FABRICATION; NANOSTRUCTURES; NICKEL; PHOTONS; POLYMERS; SCANNING ELECTRON MICROSCOPY; SILICON; TWO-DIMENSIONAL CALCULATIONS
- Descriptors DEC
- BEAMS; BOSONS; ELECTRON MICROSCOPY; ELEMENTARY PARTICLES; ELEMENTS; LEPTON BEAMS; MASSLESS PARTICLES; METALS; MICROSCOPY; PARTICLE BEAMS; SEMIMETALS; SURFACE FINISHING; TRANSITION ELEMENTS