Published August 30, 2015 | Version v1
Journal article

Investigation of focused ion beam induced damage in single crystal diamond tools

  • 1. Center for Precision Engineering, Harbin Institute of Technology, Harbin 150001 (China)
  • 2. Centre for Precision Manufacturing, Department of Design, Manufacture & Engineering Management, University of Strathclyde, Glasgow G1 1XQ (United Kingdom)

Description

Highlights: • The FIB-induced damage layer should be paid enough attention when shaping the cutting edges of nanoscale diamond tools. • During FIB processing cutting tools made of natural single crystal diamond, the Ga+ collision will create a damage layer around tool tips. • The thicknesses of damaged layer and the level for amorphization of diamond significantly increase with beam energy. • The FIB-induced doping and defects during tool fabrication are responsible for the early detection of tool wear of nanoscale diamond tools. - Abstract: In this work, transmission electron microscope (TEM) measurements and molecular dynamics (MD) simulations were carried out to characterise the focused ion beam (FIB) induced damage layer in a single crystal diamond tool under different FIB processing voltages. The results obtained from the experiments and the simulations are in good agreement. The results indicate that during FIB processing cutting tools made of natural single crystal diamond, the energetic Ga+ collision will create an impulse-dependent damage layer at the irradiated surface. For the tested beam voltages in a typical FIB system (from 8 kV to 30 kV), the thicknesses of the damaged layers formed on a diamond tool surface increased from 11.5 nm to 27.6 nm. The dynamic damage process of FIB irradiation and ion–solid interactions physics leading to processing defects in FIB milling were emulated by MD simulations. The research findings from this study provide the in-depth understanding of the wear of nanoscale multi-tip diamond tools considering the FIB irradiation induced doping and defects during the tool fabrication process

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2015.04.120

Additional details

Identifiers

DOI
10.1016/j.apsusc.2015.04.120;
PII
S0169-4332(15)00970-8;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
347
Journal Page Range
p. 727-735
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.