PEDOT:PSS Schottky contacts on annealed ZnO films
- 1. School of Science, Beijing Jiaotong University, Beijing 100044 (China)
- 2. Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190 (China)
Description
Polycrystalline ZnO and ITO films on SiO2 substrates are prepared by radio frequency (RF) reactive magnetron sputtering. Schottky contacts are fabricated on ZnO films by spin coating with a high conducting polymer, poly(3, 4-ethylenedioxythiophene): poly(styrenesulfonate) (PEDOT:PSS) as the metal electrodes. The current—voltage measurements for samples on unannealed ZnO films exhibit rectifying behaviours with a barrier height of 0.72 eV (n = 1.93). The current for the sample is improved by two orders of magnitude at 1 V after annealing ZnO film at 850 °C, whose barrier height is 0.75 eV with an ideality factor of 1.12. X-ray diffraction, atomic force microscopy and scanning electron microscopy are used to study the properties of the PEDOT:PSS/ZnO/ITO/SiO2. The results are useful for applications such as metal—semiconductor field-effect transistors and UV photodetectors. (condensed matter: electronic structure, electrical, magnetic, and optical properties)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-1056/20/4/047301Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics. B
- Journal Volume
- 20
- Journal Issue
- 4
- Journal Page Range
- [4 p.]
- ISSN
- 1674-1056
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45013637
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANNEALING; ATOMIC FORCE MICROSCOPY; ELECTRONIC STRUCTURE; EV RANGE; FIELD EFFECT TRANSISTORS; HETEROJUNCTIONS; MOSFET; ORGANIC POLYMERS; PHOTODETECTORS; POLYCRYSTALS; RADIOWAVE RADIATION; SCANNING ELECTRON MICROSCOPY; SILICON OXIDES; SPIN-ON COATING; SPUTTERING; SUBSTRATES; X-RAY DIFFRACTION; ZINC OXIDES
- Descriptors DEC
- CHALCOGENIDES; COHERENT SCATTERING; CRYSTALS; DEPOSITION; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ENERGY RANGE; FIELD EFFECT TRANSISTORS; HEAT TREATMENTS; MICROSCOPY; MOS TRANSISTORS; ORGANIC COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; POLYMERS; RADIATIONS; SCATTERING; SEMICONDUCTOR DEVICES; SEMICONDUCTOR JUNCTIONS; SILICON COMPOUNDS; SURFACE COATING; TRANSISTORS; ZINC COMPOUNDS