Published May 2011 | Version v1
Journal article

PDSOI DTMOS for analog and RF application

  • 1. Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 (China)

Description

Based on the platform of 0.35 μm PDSOI CMOS process technology, the partially depleted silicon-on-insulator dynamic threshold voltage (PDSOI DT) NMOS with an H-gate was implemented. The analog characteristics and RF characteristics of the gate-body contacted dynamic threshold voltage H-gate NMOS and conventional H-gate NMOS were performed and compared. Furthermore, the fundamental operation principle and physical mechanism of the PDSOI H-gate DTMOS compared with the conventional H-gate NMOS are analyzed in detail. The results indicate that the cutoff frequency can reach 40 GHz and the maximum oscillation frequency 29.43 GHz as Vgs = 0.7 V and Vds = 1 V (semiconductor devices)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/32/5/054004

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
32
Journal Issue
5
Journal Page Range
[5 p.]
ISSN
1674-4926

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43015489
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ELECTRIC POTENTIAL; GHZ RANGE; SEMICONDUCTOR DEVICES; SILICON
Descriptors DEC
ELEMENTS; FREQUENCY RANGE; SEMIMETALS