Atmospheric pressure plasma polymerization of organics: effect of the presence and position of double bonds on polymerization mechanisms, plasma stability and coating chemistry
Creators
- 1. Chimie analytique et chimie des interfaces, Université Libre de Bruxelles, Campus de la Plaine, Batiment A, local A.3.1402, Boulevard du Triomphe, Brussels 1050 (Belgium)
- 2. Institut de la matière condensée, Bio and Soft Matter, Institute of Condensed Matter and Nanosciences (IMCN), Université Catholique de Louvain, Boite L4.01.10 Place Louis Pasteur 1, Louvain-la-Neuve B3148 (Belgium)
Description
Highlights: • Double bonds in organic precursors modify the electrical behaviour of an atmospheric DBD • Double bonds in organic precursor induce a specific polymerization pathway in the plasma phase • A specific fragment for polymerization is evidenced when double bonds are present • The position of the double bond is of crucial importance in the preservation of the precursor chemistry -- Abstract: Oxygen rich organic coatings are synthesized in a dielectric barrier discharge at atmospheric pressure. The critical effect of the precursor structure on the final chemical and physical properties of the synthesized coatings and the plasma characteristics are reported. A correlation is proposed between the electrical, optical emission spectroscopy and atmospheric mass spectrometry (MS) measurements of the plasma phase with the chemical properties of the synthesized films. It is shown that the addition of a precursor in an argon plasma leads to a stabilization of the discharge, critically dependent on the precursor structure itself. Different polymerization pathways are evidenced for the saturated and unsaturated precursors by the monitoring of some specific fragments by MS. The polymerized coatings are also characterized with X-Ray Photoelectron Spectroscopy, Infrared Spectroscopy and Atomic Force Microscopy. The presented results not only evidence a stronger preservation of the precursor structure with double bonds in the plasma phase but also reveal the essential role of the distance separating the unsaturation and a function of interest.
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2018.12.036;
- PII
- S0040609018308460;
Publishing Information
- Journal Title
- Thin Solid Films (Print)
- Journal Volume
- 671
- Journal Page Range
- p. 64-76
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Switzerland
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 55041235
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ABSORPTION SPECTROSCOPY; ARGON; ATOMIC FORCE MICROSCOPY; COATINGS; DIELECTRIC MATERIALS; DOUBLE BONDS; EMISSION SPECTROSCOPY; INFRARED SPECTRA; MASS SPECTROSCOPY; OXYGEN; PLASMA PRESSURE; POLYMERIZATION; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CHEMICAL BONDS; CHEMICAL REACTIONS; ELECTRON SPECTROSCOPY; ELEMENTS; FLUIDS; GASES; MATERIALS; MICROSCOPY; NONMETALS; PHOTOELECTRON SPECTROSCOPY; RARE GASES; SPECTRA; SPECTROSCOPY
Optional Information
- Copyright
- Copyright (c) 2018 Published by Elsevier B.V.