Published August 1994
| Version v1
Journal article
Oxidation of copper by fast atomic oxygen
Creators
- 1. Univ. of Alabama, Huntsville, AL (United States)
- 2. Space Science Lab., Huntsville, AL (United States)
Description
The surface composition of the oxide formed on thin-film and solid OFHC copper samples exposed to a fast-atomic-oxygen environment in a low-earth orbit on NASA's Long Duration Exposure Facility (LDEF) was investigated using X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), thin-film X-ray diffraction (TF-XRD), high-resolution profilometry, and reflectance measurements. The results confirm that it is easier to form thick copper oxide layers in the atomic oxygen ambient than is normally possible with other laboratory-based techniques
Additional details
Publishing Information
- Journal Title
- Oxidation of Metals
- Journal Volume
- 42
- Journal Issue
- 1-2
- Journal Page Range
- p. 1-15.
- ISSN
- 0030-770X
- CODEN
- OXMEAF
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 26065750
- Subject category
- S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
- Descriptors DEI
- COPPER; OXIDATION; OXYGEN; PHYSICAL RADIATION EFFECTS; SPACE FLIGHT; THIN FILMS
- Descriptors DEC
- CHEMICAL REACTIONS; ELEMENTS; FILMS; METALS; NONMETALS; RADIATION EFFECTS; TRANSITION ELEMENTS