Published June 1984
| Version v1
Journal article
Mechanism of oxygen adsorption on tantalum
Description
The mechanism of oxygen adsorption and dissolution in tantalum is suggested. The equation of oxygen diffusion in vacancies formed by ion etching in the near-surface layer is solved. The theoretically calculated oxygen diffusion curves are compared with the experimental curves in order to determine the diffusion coefficient. The dependence of the oxygen atom accommodation coefficient on the degree of coating with adsorbed atoms is obtained
Additional details
Additional titles
- Original title (Russian)
- Механизм адсорбции кислорода на тантале
Publishing Information
- Journal Title
- Fiz. Tverd. Tela
- Journal Volume
- 26
- Journal Issue
- 6
- Series
- Fiz. Tverd. Tela.
- Journal Page Range
- 1746-1749
- ISSN
- 0367-3294
INIS
- Country of Publication
- Russian Federation
- Country of Input or Organization
- USSR
- INIS RN
- 16037826
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ADSORPTION; DIFFUSION; DISSOLUTION; EQUATIONS; OXYGEN; SURFACES; TANTALUM; VACANCIES
- Descriptors DEC
- CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELEMENTS; METALS; NONMETALS; POINT DEFECTS; TRANSITION ELEMENTS
Optional Information
- Notes
- For English translation see the journal Soviet Physics - Solid State (USA).