Published July 15, 1995
| Version v1
Journal article
Accommodation of strain in ultrathin InAs/GaAs films
Creators
- 1. National Institute of Standards and Technology, Gaithersburg, Maryland 20899 (United States)
- 2. Department of Physics, Brooklyn College, Brooklyn, New York 11210 (United States)
Description
X-ray standing-wave and extended x-ray-absorption fine-structure measurements have determined the strain and bond distortions in a buried InAs monolayer grown epitaxially on GaAs(001). The In atoms are found to reside 1.64±0.03 A above the last-As plane of the GaAs substrate with an In-As bond length of 2.57±0.02 A. Relative to bulk InAs, this corresponds to an 8% expansion in the In-As planar distance perpendicular to the interface and a 0.05-A compression in the In-As bond length. This experiment indicates that macroscopic-elastic theory describes the distortions in InAs/GaAs(001) films even in the monolayer limit
Additional details
Publishing Information
- Journal Title
- Physical Review. B, Condensed Matter
- Journal Volume
- 52
- Journal Issue
- 4
- Journal Page Range
- p. R2281-R2284.
- ISSN
- 0163-1829
- CODEN
- PRBMDO
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 26070746
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- BOND LENGTHS; GALLIUM ARSENIDES; INDIUM ARSENIDES; STRAINS; THIN FILMS; X-RAY SPECTROSCOPY
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; FILMS; GALLIUM COMPOUNDS; INDIUM COMPOUNDS; PNICTIDES; SPECTROSCOPY