Published July 15, 1995 | Version v1
Journal article

Accommodation of strain in ultrathin InAs/GaAs films

  • 1. National Institute of Standards and Technology, Gaithersburg, Maryland 20899 (United States)
  • 2. Department of Physics, Brooklyn College, Brooklyn, New York 11210 (United States)

Description

X-ray standing-wave and extended x-ray-absorption fine-structure measurements have determined the strain and bond distortions in a buried InAs monolayer grown epitaxially on GaAs(001). The In atoms are found to reside 1.64±0.03 A above the last-As plane of the GaAs substrate with an In-As bond length of 2.57±0.02 A. Relative to bulk InAs, this corresponds to an 8% expansion in the In-As planar distance perpendicular to the interface and a 0.05-A compression in the In-As bond length. This experiment indicates that macroscopic-elastic theory describes the distortions in InAs/GaAs(001) films even in the monolayer limit

Additional details

Publishing Information

Journal Title
Physical Review. B, Condensed Matter
Journal Volume
52
Journal Issue
4
Journal Page Range
p. R2281-R2284.
ISSN
0163-1829
CODEN
PRBMDO

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
26070746
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
BOND LENGTHS; GALLIUM ARSENIDES; INDIUM ARSENIDES; STRAINS; THIN FILMS; X-RAY SPECTROSCOPY
Descriptors DEC
ARSENIC COMPOUNDS; ARSENIDES; FILMS; GALLIUM COMPOUNDS; INDIUM COMPOUNDS; PNICTIDES; SPECTROSCOPY