Characteristics of pentacene organic thin film transistor with top gate and bottom contact
Creators
- 1. Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, China Key Laboratory of Luminescence and Optical Information (Beijing Jiaotong University), Ministry of Education, Beijing 100044 (China)
Description
High performance pentacene organic thin film transistors (OTFT) were designed and fabricated using SiO2 deposited by electron beam evaporation as gate dielectric material. Pentacene thin films were prepared on glass substrate with S–D electrode pattern made from ITO by means of thermal evaporation through self-organized process. The threshold voltage VTH was −2.75±0.1V in 0 – −50V range, and that subthreshold slopes were 0.42±0.05V/dec. The field-effect mobility (μEF) of OTFT device increased with the increase of VDS, but the μEF of OTFT device increased and then decreased with increased VGS when VDS was kept constant. When VDS was −50V, on/off current ratio was 0.48 × 105 and subthreshold slope was 0.44V/dec. The μEF was 1.10cm2/(V-s), threshold voltage was −2.71V for the OTFT device
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-1056/17/5/057Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics. B
- Journal Volume
- 17
- Journal Issue
- 5
- Journal Page Range
- p. 1887-1892
- ISSN
- 1674-1056
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44125168
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- DIELECTRIC MATERIALS; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ELECTRON BEAMS; ENERGY BEAM DEPOSITION; EVAPORATION; GLASS; MOBILITY; PENTACENE; SILICON OXIDES; SUBSTRATES; THIN FILMS; TRANSISTORS
- Descriptors DEC
- AROMATICS; BEAMS; CHALCOGENIDES; CONDENSED AROMATICS; CURRENTS; DEPOSITION; FILMS; HYDROCARBONS; LEPTON BEAMS; MATERIALS; ORGANIC COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PARTICLE BEAMS; PHASE TRANSFORMATIONS; SEMICONDUCTOR DEVICES; SILICON COMPOUNDS; SURFACE COATING