Published December 31, 2007 | Version v1
Journal article

Zone-Doubling Technique to Produce Ultrahigh-Resolution X-Ray Optics

  • 1. EMPA, CH-8600 Duebendorf (Switzerland)
  • 2. Paul Scherrer Institut, CH-5232 Villigen PSI (Switzerland)
  • 3. Laboratori de Llum Sincrotro, E-08193 Bellaterra (Spain)
  • 4. Laboratory of Inorganic Chemistry, University of Helsinki, FI-00014 Helsinki (Finland)

Description

A method for the fabrication of ultrahigh-resolution Fresnel zone plate lenses for x-ray microscopy is demonstrated. It is based on the deposition of a zone plate material (Ir) onto the sidewalls of a prepatterned template structure (Si) using an atomic layer deposition technique. This results in a doubling of the effective zone density, thus improving the achievable resolution of x-ray microscopes. Test structures with lines and spaces down to 15 nm were resolved in a scanning transmission x-ray microscope at 1 keV photon energy

Additional details

Publishing Information

Journal Title
Physical Review Letters
Journal Volume
99
Journal Issue
26
Journal Page Range
p. 264801-264801.4
ISSN
0031-9007
CODEN
PRLTAO

Optional Information

Notes
(c) 2007 The American Physical Society