Published December 31, 2007
| Version v1
Journal article
Zone-Doubling Technique to Produce Ultrahigh-Resolution X-Ray Optics
- 1. EMPA, CH-8600 Duebendorf (Switzerland)
- 2. Paul Scherrer Institut, CH-5232 Villigen PSI (Switzerland)
- 3. Laboratori de Llum Sincrotro, E-08193 Bellaterra (Spain)
- 4. Laboratory of Inorganic Chemistry, University of Helsinki, FI-00014 Helsinki (Finland)
Description
A method for the fabrication of ultrahigh-resolution Fresnel zone plate lenses for x-ray microscopy is demonstrated. It is based on the deposition of a zone plate material (Ir) onto the sidewalls of a prepatterned template structure (Si) using an atomic layer deposition technique. This results in a doubling of the effective zone density, thus improving the achievable resolution of x-ray microscopes. Test structures with lines and spaces down to 15 nm were resolved in a scanning transmission x-ray microscope at 1 keV photon energy
Additional details
Identifiers
Publishing Information
- Journal Title
- Physical Review Letters
- Journal Volume
- 99
- Journal Issue
- 26
- Journal Page Range
- p. 264801-264801.4
- ISSN
- 0031-9007
- CODEN
- PRLTAO
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39050152
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- DEPOSITION; LAYERS; LENSES; LIGHT TRANSMISSION; MICROSCOPES; MICROSCOPY; OPTICS; PHOTONS; PLATES; RESOLUTION; X RADIATION
- Descriptors DEC
- BOSONS; ELECTROMAGNETIC RADIATION; ELEMENTARY PARTICLES; IONIZING RADIATIONS; MASSLESS PARTICLES; RADIATIONS; TRANSMISSION
Optional Information
- Notes
- (c) 2007 The American Physical Society