Published July 30, 2008 | Version v1
Journal article

Monolithic GaAs/InGaP nanowire light emitting diodes on silicon

  • 1. Qunano AB, Scheelevaegen 17, Ideon Science Park, S-223 70 Lund (Sweden)
  • 2. Solid State Physics/The Nanometer Consortium, Lund University, PO Box 118, S-221 00 Lund (Sweden)
  • 3. Svedice AB, PO Box 685, SE-175 27 Jaerfaella (Sweden)

Description

Vertical light emitting diodes (LEDs) based on GaAs/InGaP core/shell nanowires, epitaxially grown on GaP and Si substrates, have been fabricated. The devices can be fabricated over large areas and can be precisely positioned on the substrates, by the use of standard lithography techniques, enabling applications such as on-chip optical communication. LED functionality was established on both kinds of substrate, and the devices were evaluated in terms of temperature-dependent photoluminescence and electroluminescence

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/19/30/305201

Additional details

Identifiers

DOI
10.1088/0957-4484/19/30/305201;
PII
S0957-4484(08)77589-5;

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
19
Journal Issue
30
Journal Page Range
[6 p.]
ISSN
0957-4484