Luminescence mechanism for Er3+ ions in a silicon-rich nitride host under electrical pumping
Creators
- 1. MIND-IN2UB, Dept. Electrònica, Universitat de Barcelona, Martí i Franquès 1, 08028, Barcelona (Spain)
- 2. Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Bautzner Landstraße 400, 01328 Dresden (Germany)
- 3. IMTEK, Faculty of Engineering, Albert-Ludwigs-University Freiburg, Georges-Köhler-Allee 103, 79110 Freiburg (Germany)
- 4. Instituto Superior Politécnico de Tecnologias e Ciências (ISPTEC), Av. Luanda Sul, Rua Lateral Via S10, Talatona, Luanda (Angola)
Description
A combined experimental and theoretical study on the electroluminescent excitation mechanism for trivalent erbium (Er3+) ions in a silicon-rich nitride (SiNx) host is presented. Direct impact by hot electrons is demonstrated to be the fundamental excitation mechanism. The Er3+ excitation by energy transfer from silicon nanostructures and/or defects is shown to be marginal under electrical pumping. A bilayer structure made of a SiO2 electron-accelerating layer and an Er-implanted SiNx layer has been sandwiched between a metal–insulator–semiconductor structure with a highly doped N-type silicon substrate and an indium–tin–oxide window functioning as a transparent electrode. Monte Carlo (MC) simulations are used to model hot electron transport in the proposed device structure. Acoustic, polar and non-polar optical electron–phonon scattering mechanisms are considered as well as a new scattering process related to the trapping/detrapping on energetically shallow traps in the band gap of silicon nitride. For SiO2 layers around 20 nm-thick and beyond, the number and kinetic energy of hot electrons before entering the SiNx layer are maximal. A significant enhancement of the 1.54 μm electroluminescence power efficiency of two orders of magnitude is observed in devices composed of a 20 nm-thick SiO2 layer compared to those composed of 10 nm-thick SiO2. We demonstrate by MC simulations that such a difference, in terms of power efficiency, is ascribed to the high-energy tail of the hot electron energy distribution, which becomes more pronounced as the SiO2 electron-accelerating layer thickness increases. It is also unveiled that direct excitation of the 1.54 μm Er3+ main radiative transition requiring an excitation energy of only 0.8 eV is inefficient, and that the major part of the Er3+ ions are excited via higher level energy states. The obtained results are sufficiently consistent to be extended to other trivalent rare-earth ions inside similar insulating material environments. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0022-3727/49/8/085106Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 49
- Journal Issue
- 8
- Journal Page Range
- [11 p.]
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47067701
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- DOPED MATERIALS; ELECTRICAL PUMPING; ELECTROLUMINESCENCE; ENERGY SPECTRA; ERBIUM IONS; EXCITATION; LAYERS; SCATTERING; SILICON; SILICON NITRIDES; SILICON OXIDES; SIMULATION
- Descriptors DEC
- CHALCOGENIDES; CHARGED PARTICLES; ELEMENTS; EMISSION; ENERGY-LEVEL TRANSITIONS; IONS; LUMINESCENCE; MATERIALS; NITRIDES; NITROGEN COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PHOTON EMISSION; PNICTIDES; PUMPING; SEMIMETALS; SILICON COMPOUNDS; SPECTRA