Published 1987 | Version v1
Book Metadata-only

Tungsten and other refractory metals for VLSI applications II

Creators

Description

This book presents papers on tungsten and other refractory metals for VLSI applications. Topics include the following: Selectivity loss and nucleation on insulators, fundamental reaction and growth studies, chemical vapor deposition of tungsten, chemical vapor deposition of molybdenum, reactive ion etching of refractory metal films; and properties of refractory metals deposited by sputtering

Additional details

Publishing Information

Publisher
Materials Research Society.
Imprint Place
Pittsburgh, PA (USA)
ISBN
0-931837-66-9
Imprint Pagination
426 p.

Conference

Title
Workshop on tungsten and other refractory metals for VLSI applications.
Dates
12-14 Nov 1986.
Place
Palo Alto, CA (USA).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
19093012
Subject category
S42: ENGINEERING; S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CHEMICAL VAPOR DEPOSITION; ETCHING; INTEGRATED CIRCUITS; MEETINGS; NUCLEATION; SPUTTERING; THIN FILMS; TUNGSTEN
Descriptors DEC
CHEMICAL COATING; DEPOSITION; ELECTRONIC CIRCUITS; ELEMENTS; FILMS; METALS; SURFACE COATING; TRANSITION ELEMENTS

Optional Information

Secondary number(s)
CONF-8611130--.