Published July 2018 | Version v1
Journal article

Sequential deposition of hybrid halide perovskite starting both from lead iodide and lead chloride on the most widely employed substrates

  • 1. Università del Salento, Dipartimento di Matematica e Fisica "E. De Giorgi", Via per Arnesano, Lecce 73100 (Italy)
  • 2. Department of Civil Engineering and Architecture (DICAR), Politecnico di Bari, via Orabona 4, 70125 Bari (Italy)
  • 3. Istituto di Nanotecnologia CNR-Nanotec, Distretto Tecnologico via Arnesano 16, 73100 Lecce (Italy)

Description

Highlights: • A sequential deposition procedure for obtaining hybrid halide perovskite is reported. • An original last step is added to the procedure to even out the drying step. • The substrates investigated are TiO2, NiO, and Al2O3. • The two-step deposition based on a PbCl2 film is proposed. - Abstract: The introduction of hybrid perovskites is revolutionizing the field of solution processable next-generation optoelectronic devices, with outstanding results achieved in solar energy conversion devices, lasing, light emitting diodes, and thermoelectric generators. An intelligent design of the material properties is a critical element in the technological development of such devices and, to achieve it, excellent control of the material deposition procedures is of paramount importance. Here we compare the growth of hybrid perovskite, starting both from lead iodide and lead chloride, through a simple two-step method on the most widely employed substrates, and we present diverse morphologies, realized varying the substrates and the deposition procedures.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2018.05.022

Additional details

Identifiers

DOI
10.1016/j.tsf.2018.05.022;
PII
S0040609018303353;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
657
Journal Page Range
p. 110-117
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.