Electron-irradiation damage in antimony-doped silicon
Creators
- 1. General Electric Corporate Research and Development, Schenectady, New York 12301
Description
The electron trapping centers induced by electron irradiation in antimony-doped silicon have been studied by deep-level transient capacitance spectroscopy. Four such traps -- E1(E/sub c/-0.17 eV), E2(E/sub c/-0.22 eV), E3(E/sub c/-0.28 eV), and E4(E/sub c/-0.39 eV) -- are visible in the spectrum. Of particular interest is the antimony-vacancy pair, E4. The capture cross section for majority carriers at this level is 4.5 x 10-17 cm-2 at 234 K. The annealing studies of the Sb-V complex indicate first-order kinetics with activation energies of 1.29 and 1.62 eV for the neutral and negative charge states of the complex, respectively. Also, this dependence on the charge state results in the annealing rate at 1750C being an order of magnitude greater when the Sb-V complex is in the neutral charge state than it is when the complex is in the negative charge state
Additional details
Identifiers
- DOI
- 10.1063/1.323663;
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 48
- Journal Issue
- 2
- Series
- J. Appl. Phys.
- Journal Page Range
- 734-738
- ISSN
- 0021-8979
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 8310077
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; ANTIMONY; DOPED MATERIALS; ELECTRON BEAMS; HIGH TEMPERATURE; IRRADIATION; PHYSICAL RADIATION EFFECTS; SILICON; SPECTRA; TRAPPING; VACANCIES
- Descriptors DEC
- BEAMS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELEMENTS; HEAT TREATMENTS; LEPTON BEAMS; METALS; PARTICLE BEAMS; POINT DEFECTS; RADIATION EFFECTS; SEMIMETALS
Optional Information
- Notes
- Updated automatically by Metadata and Full-Text Enrichment Agent