Published February 1977 | Version v1
Journal article

Electron-irradiation damage in antimony-doped silicon

  • 1. General Electric Corporate Research and Development, Schenectady, New York 12301

Description

The electron trapping centers induced by electron irradiation in antimony-doped silicon have been studied by deep-level transient capacitance spectroscopy. Four such traps -- E1(E/sub c/-0.17 eV), E2(E/sub c/-0.22 eV), E3(E/sub c/-0.28 eV), and E4(E/sub c/-0.39 eV) -- are visible in the spectrum. Of particular interest is the antimony-vacancy pair, E4. The capture cross section for majority carriers at this level is 4.5 x 10-17 cm-2 at 234 K. The annealing studies of the Sb-V complex indicate first-order kinetics with activation energies of 1.29 and 1.62 eV for the neutral and negative charge states of the complex, respectively. Also, this dependence on the charge state results in the annealing rate at 1750C being an order of magnitude greater when the Sb-V complex is in the neutral charge state than it is when the complex is in the negative charge state

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
48
Journal Issue
2
Series
J. Appl. Phys.
Journal Page Range
734-738
ISSN
0021-8979

Optional Information

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