Published November 2010 | Version v1
Journal article

Effect of film thickness on interfacial barrier of manganite-based heterojunctions

  • 1. State Key Laboratory of Metastable Materials Science and Technology, Yanshan University, Qinhuangdao 066004 (China)
  • 2. Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190 (China)

Description

Interfacial barrier is a key factor that determines the performances of heterojunctions. In this work, we study the effect of manganite film thickness on the effective interfacial barrier for La0.67Sr0.33MnO3/Nb:SrTiO3 junctions. The barrier is extracted from the forward current-voltage characteristics. Our results demonstrate that the barrier decreases gradually from ∼0.85 eV to ∼0.60 eV when the film thickness decreases from 150 nm to 2 nm. The overall value of the barrier is only about 50% of the corresponding one determined from the photovoltaic effect. (rapid communication)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-1056/19/11/117306

Additional details

Publishing Information

Journal Title
Chinese Physics. B
Journal Volume
19
Journal Issue
11
Journal Page Range
[5 p.]
ISSN
1674-1056