Helium implantation effects in palladium at high doses

Abstract Helium release, bubble and blister formation effects on the surface and in the bulk of high dose helium implanted palladium have been studied using helium mass spectrometry, scanning electron microscopy, transmission electron microscopy, and x-ray diffraction. The dependence of these effects on implantation dose up to 2 × 1018 He atoms/cm2, implantation temperature (− 180°C to + 200°C) and limited pretreatment has been investigated. A strongly dosc dependent low temperature (− 180°C to 200°C) fractional helium release and accompanying surface deformation was found at high doses, and a qualitative model for these low temperature results is presented.