The effect of the driving frequency on the optimum hole diameter for efficient multi-hole electrode RF capacitively coupled plasma
- 1. Institute of Advanced Composite Materials, KIST, San 101, Eunha-ri, Bongdong-eup, Wanju-gun, Jeollabukdo 565-905 (Korea, Republic of)
- 2. Web Engineering Laboratory, Division of Web Science and Technology, KAIST, Guseong-dong, Yuseong-gu, Daejeon 305-701 (Korea, Republic of)
- 3. 2327, Department of Physics, KAIST, Guseong-dong, Yuseong-gu, Daejeon 305-701 (Korea, Republic of)
Description
In capacitively coupled plasma, the driving frequency is changed to modify the ion bombardment energy and electron density. The multi-hole electrode capacitively coupled plasma is discharged with various driving frequencies of 13.56 MHz, 27.12 MHz, and 40.68 MHz, in order to elucidate the frequency effects of the discharge. The change of the driving frequency modifies the plasma parameters and the length of the sheath. As a result, the optimum diameter of the holes on the multi-hole electrode for efficient capacitively coupled plasma discharge changes. - Highlights: ►The multi-hole electrode plasma is capacitively discharged at various frequencies. ► When the driving frequency increases the length of the sheath decreases. ► When the hole diameter is 2∼3 times the sheath length, electron density is high. ► Smaller hole diameter is needed to discharge high density plasma at high frequency
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2012.11.045Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2012.11.045;
- PII
- S0040-6090(12)01542-8;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 547
- Journal Page Range
- p. 289-292
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 4. international conference on microelectronics and plasma technology
- Acronym
- ICMAP 2012
- Dates
- 4-7 Jul 2012
- Place
- Jeju (Korea, Republic of)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46128469
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ELECTRODES; ELECTRON DENSITY; FREQUENCY DEPENDENCE; HIGH-FREQUENCY DISCHARGES; LENGTH; MHZ RANGE; PLASMA DENSITY; PLASMA PRODUCTION
- Descriptors DEC
- DIMENSIONS; ELECTRIC DISCHARGES; FREQUENCY RANGE
Optional Information
- Copyright
- Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.