Published November 29, 2013 | Version v1
Journal article

The effect of the driving frequency on the optimum hole diameter for efficient multi-hole electrode RF capacitively coupled plasma

  • 1. Institute of Advanced Composite Materials, KIST, San 101, Eunha-ri, Bongdong-eup, Wanju-gun, Jeollabukdo 565-905 (Korea, Republic of)
  • 2. Web Engineering Laboratory, Division of Web Science and Technology, KAIST, Guseong-dong, Yuseong-gu, Daejeon 305-701 (Korea, Republic of)
  • 3. 2327, Department of Physics, KAIST, Guseong-dong, Yuseong-gu, Daejeon 305-701 (Korea, Republic of)

Description

In capacitively coupled plasma, the driving frequency is changed to modify the ion bombardment energy and electron density. The multi-hole electrode capacitively coupled plasma is discharged with various driving frequencies of 13.56 MHz, 27.12 MHz, and 40.68 MHz, in order to elucidate the frequency effects of the discharge. The change of the driving frequency modifies the plasma parameters and the length of the sheath. As a result, the optimum diameter of the holes on the multi-hole electrode for efficient capacitively coupled plasma discharge changes. - Highlights: ►The multi-hole electrode plasma is capacitively discharged at various frequencies. ► When the driving frequency increases the length of the sheath decreases. ► When the hole diameter is 2∼3 times the sheath length, electron density is high. ► Smaller hole diameter is needed to discharge high density plasma at high frequency

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2012.11.045

Additional details

Identifiers

DOI
10.1016/j.tsf.2012.11.045;
PII
S0040-6090(12)01542-8;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
547
Journal Page Range
p. 289-292
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
4. international conference on microelectronics and plasma technology
Acronym
ICMAP 2012
Dates
4-7 Jul 2012
Place
Jeju (Korea, Republic of)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46128469
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ELECTRODES; ELECTRON DENSITY; FREQUENCY DEPENDENCE; HIGH-FREQUENCY DISCHARGES; LENGTH; MHZ RANGE; PLASMA DENSITY; PLASMA PRODUCTION
Descriptors DEC
DIMENSIONS; ELECTRIC DISCHARGES; FREQUENCY RANGE

Optional Information

Copyright
Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.