Features of magnetron sputtering of a doubled Ta/Ti target

In this work, investigation of magnetron sputtering process of the doubled Ta/Ti target is presented. Such a construction allows to simultaneously sputter two materials, forming complex film structures on a substrate. The results of computer simulation and experimental investigation of the thermal behavior of the target, current-voltage and spectral characteristics of discharges, and characterization of the fabricated coating samples are given. (paper)