Textured Nd-Fe-B hard magnetic thin films prepared by pulsed laser deposition with single alloy targets
- 1. Univ. Limoges, CNRS, IRCER, UMR 7315, 87068 Limoges (France)
- 2. Univ. Grenoble Alpes, CNRS, Institut NEEL, 38000 Grenoble (France)
Description
Nd-Fe-B thin films have been successfully developed by Pulsed Laser Deposition (PLD) onto silicon substrates. In order to explore the crucial role of target composition during PLD, five single alloy targets, representing specific atomic compositions (Nd/Fe atomic ratio varied in the range 0.18–0.47) have been tested and studied. In a determined deposition temperature range of 550 °C-630 °C, thin films made from a target with Nd/Fe = 0.45 present the best hard magnetic properties, a quasi-single magnetic phase, both coercivity and remanence above 1 T and a square loop shape. FIB-ESB analyses associated with XRD, SEM and SQUID-VSM magnetic measurements indicate that the high values of both remanent magnetization and coercivity are ascribed to film texturation and to partial decoupling of the hard magnetic Nd2Fe14B grains by a secondary Nd-rich phase. PLD performed with other target compositions and non-optimized deposition temperatures leads to poorer magnetic properties, owing to the presence of soft magnetic phase and non-textured or oxidized thin films.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jmmm.2020.167584Additional details
Identifiers
- DOI
- 10.1016/j.jmmm.2020.167584;
- PII
- S0304885320325518;
Publishing Information
- Journal Title
- Journal of Magnetism and Magnetic Materials
- Journal Volume
- 520
- Journal Page Range
- vp.
- ISSN
- 0304-8853
- CODEN
- JMMMDC
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 54043084
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALLOYS; COERCIVE FORCE; ENERGY BEAM DEPOSITION; LASER RADIATION; MAGNETIC PROPERTIES; MAGNETIZATION; PULSED IRRADIATION; SCANNING ELECTRON MICROSCOPY; SILICON; SQUID DEVICES; SUBSTRATES; TEMPERATURE RANGE; THIN FILMS; X-RAY DIFFRACTION
- Descriptors DEC
- COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; FLUXMETERS; IRRADIATION; MEASURING INSTRUMENTS; MICROSCOPY; MICROWAVE EQUIPMENT; PHYSICAL PROPERTIES; RADIATIONS; SCATTERING; SEMIMETALS; SUPERCONDUCTING DEVICES; SURFACE COATING
Optional Information
- Copyright
- Copyright (c) 2020 Elsevier B.V. All rights reserved.