Fabrication of large diameter alumino-silicate K+ sources

Alumino-silicate K+ sources have been used in HIF experiments for many years. For example the Neutralized Transport Expt. (NTX) and the High Current Transport Expt. (HCX) are now using this type of ion source with diameters of 2.54 cm and 10 cm respectively. These sources have demonstrated ion currents of 80 mA and 700 mA, for typical HIF pulse lengths of 5-10 (micro)s. The corresponding current density is ∼ 10-15 mA/cm2, but much higher current density has been observed using smaller size sources. Recently we have improved our fabrication techniques and, therefore, are able to reliably produce large diameter ion sources with high quality emitter surface without defects. This note provides a detailed description of the procedures employed in the fabrication process. The variables in the processing steps affecting surface quality, such as substrate porosity, powder size distribution, coating technique on large area concave surfaces, drying, and heat firing temperature have been investigated