Modification in etching characteristics and surface topography of some electron irradiated polymers

Track formation in polymers is a complex phenomenon in which not only primary but also secondary processes, such as formation of radicals and chemical processes, are involved. In the present work, the influence of 2 MeV electrons on the etching properties and the surface topography of polyethylene terephthalate (PET) and polyimide (PI) are studied. The increase in the bulk etch-rate and a decrease in the activation energy of etching were observed for both the polymers. The surface roughness of both polymers was reduced due to electron irradiation