Published December 4, 1969 | Version v1
Patent Restricted

Electron beam irradiation device

Description

For sufficiently irradiating an electron beam over a film the thickness of which is extremely small in comparison to the electron beam path length, the film is so fed by guide rollers as to be subject to radiation a number of times. The guide rollers are disposed along the line of a rectangular spiral and the film is laid on the guide rollers without any one section of the film contacting the other so that sections of the film overlap each other in the plane of the irradiated beam. The overlapped sections are thus irradiated while the film is fed toward the center of the spiral and are taken up through an inclined guide roller disposed at the center of the spiral. Since one side of the film never contacts the guide rollers during irradiation, any coating applied over this side is allowed to harden without disruption. (Ohno, Y.)

Availability note (English)

MF available from INIS under the Report Number.

Files

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Additional details

Publishing Information

Imprint Pagination
3 p.
IPC:
Int. Cl. H05H5/02.
IPC
Int. Cl. H05H5/02.
Patent number
JP patent document 1975-25598/B/

INIS

Country of Publication
Japan
Country of Input or Organization
Japan
INIS RN
8281579
Subject category
S43: PARTICLE ACCELERATORS;
Descriptors DEI
COATINGS; ELECTRON BEAMS; FILMS; IRRADIATION DEVICES; IRRADIATION PROCEDURES; PERFORMANCE; SPIRAL CONFIGURATION
Descriptors DEC
BEAMS; CONFIGURATION; LEPTON BEAMS; PARTICLE BEAMS