Pulsewidth and ambient medium effects during ultrashort-pulse laser ablation of silicon in air and water
- 1. P. N. Lebedev Physical Institute of the Russian Academy of Sciences, 119991 Moscow (Russian Federation)
Description
Highlights: • Laser ablation of Si was performed both in air and water environments at different fleunces and variable pulsewidths. • Only shallow spallation occurred in air for 10-ps laser pulses, comparing to spallation and phase explosion for shorter pulses. • Shallow laser ablation occurred in water at supercritical peak pulse powers due to laser beam self-focusing and filamentation. • Intense, phase explosion-like ablation takes place during wet ablation by 10-ps laser pulses at sub-critical peak pulse powers. Comparative single-shot pulse study of ablation topographies and depths on Si surfaces excited by 1030-nm sub- (0.3 ps) and pico-picosecond (10 ps) laser pulses at different laser fluences in air and water environments was performed. Fast energy transport via 3D-diffusion of dense electron-hole plasma was revealed at picosecond timescale to extend transversely the ablation craters over the focal spot in air for laser pulse widths shorter, than electron–phonon thermalization time about 3 ps. In the given fluence range fluence-independent shallow ablation was observed in air for 10-ps pulses. Then, rather shallow laser ablation occurred in water at supercritical peak pulse powers, apparently, due to laser beam deterioration by self-focusing and filamentation. Finally, very intense, fluence-dependent material removal took place during wet ablation by 10-ps laser pulses at the sub-critical peak pulse powers. Electron-hole plasma and related energy transport on Si surface, 1030-nm laser pulse filamentation in water, pulsewidth and ambient medium effects were revealed during the surface ablation studies.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2021.150243Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2021.150243;
- PII
- S0169433221013192;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 562
- Journal Page Range
- vp.
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 54079151
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ABLATION; AIR; LASERS; NATURAL GAS DISTRIBUTION SYSTEMS; PEAKS; POWER TRANSMISSION; SOLID-STATE PLASMA
- Descriptors DEC
- ENERGY SYSTEMS; FLUIDS; GASES; PLASMA
Optional Information
- Copyright
- Copyright (c) 2021 Elsevier B.V. All rights reserved.