SEM and XPS analyses of magnetron sputtered TiN functional films on AISI D6 and AISI M2 steel substrates

Full text: The current technological applications of materials, mainly metals covered with nitride films are vast. However, now a lot of investigations exist with the objective of more and more to optimize the adherence of these films in steels substrate seeking to enlarge its application fields. The nitride films based on metallic cations, as titanium, zirconium, chrome and aluminum, have demonstrated to be interesting in applications where are necessary high surface hardness, corrosion and fracture resistance. However, the adherence of these films has been the main limitation for the tribological applications that demand high mechanic resistance. In this work, it was proposed the study of techniques of the film/substrate interface dilution: 1) diffusion or interdiffusion provoked by temperature and 2) gradual variation of the chemical composition of the film/substrate interface (functional films). In this work, the TiN functional films depositions on AISI M2 and AISI D6 were accomplished. These functional films were obtained through magnetron sputtering. The main objective was creating diluted interfaces that they are areas where the properties of the film and substrate vary in a gradual way. These interfaces formed areas of tensions absorption generated by the functional film deposited. All the films were characterized by scanning electron microscope (SEM), energy dispersive spectrometry (EDS) and X ray photoelectron spectroscopy (XPS). These results showed a great adherence of the nitride titanium functional film deposited in AISI M2 and AISI D6 steels substrate. (author)