Published October 1, 1995
| Version v1
Report
Fine pitch grids for an x-ray solar imaging spectrometer fabricated by optical lithography and XeF2 etching
Description
no abstract available
Availability note (English)
Available at (additional information): www.als.lbl.gov/Additional details
Publishing Information
- Imprint Pagination
- [vp.]
- Report number
- LBNL/ALS--265
Conference
- Title
- Microlithography and Metrology in Micromachining
- Acronym
- 1995 SPIE
- Dates
- 23-24 Oct 1995
- Place
- Austin, TX (United States)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 33064620
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Resource subtype / Literary indicator
- No Abstract, Conference, Non-conventional Literature
- Descriptors DEI
- COATINGS; ETCHING; IMAGES; MASKING; SUN; X-RAY SPECTROMETERS; XENON FLUORIDES
- Descriptors DEC
- FLUORIDES; FLUORINE COMPOUNDS; HALIDES; HALOGEN COMPOUNDS; MAIN SEQUENCE STARS; MEASURING INSTRUMENTS; RARE GAS COMPOUNDS; SPECTROMETERS; STARS; SURFACE FINISHING; XENON COMPOUNDS
Optional Information
- Contract/Grant/Project number
- AC03-76SF00098
- Funding organization
- US Department of Energy (United States)