Thin film AlGaInP light emitting diodes with different reflectors
- 1. Key Laboratory of Opto-Electronics Technology of Ministry of Education, Beijing University of Technology, Beijing 100124 (China)
Description
The reflectivity versus incident angle of a GaP/Au reflector, a GaP/SiO2/Au triple ODR (omni-directional reflector) and a GaP/ITO/Au triple ODR was calculated. Compared to AlGaInP LEDs with a GaAs absorbing substrate, thin film LEDs with a Au reflector, a SiO2 ODR and an ITO ODR were fabricated. At a current of 20 mA, the optical output power of four samples was respectively 1.04, 1.14, 2.53 and 2.15 mW. The Au diffusion in the annealing process reduces the reflectivity of the Au/GaP reflector to 9%. The different transmittance of quarter-wave thickness ITO and SiO2 induces different optical output power between the SiO2 and ITO thin film LEDs. The insertion of Zn in the ITO ODR LED does not affect the light output but evidently reduces the voltage. (semiconductor devices)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/31/12/124013Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 31
- Journal Issue
- 12
- Journal Page Range
- [3 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43013285
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ACCIDENTS; ELECTRIC POTENTIAL; GALLIUM ARSENIDES; LIGHT EMITTING DIODES; SILICA; SILICON OXIDES; SUBSTRATES; THIN FILMS; VISIBLE RADIATION
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; CHALCOGENIDES; ELECTROMAGNETIC RADIATION; FILMS; GALLIUM COMPOUNDS; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PNICTIDES; RADIATIONS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES; SILICON COMPOUNDS