Published August 1994
| Version v1
Journal article
Metallography and analysis techniques
Creators
- 1. Regie Nationale des Usines Renault, 92 -Boulogne (France)
- 2. Electricite de France (EDF), 77 - Ecuelles (France)
Description
After a recall of electrons interactions mechanisms (elastic and inelastic diffusion) and ions interactions mechanisms with matter stopping power and sputtering, this second part of the article describes techniques using electrons and ions for analysis in metallography. (A.B.). 8 figs
Additional details
Additional titles
- Original title (French)
- Metallographie et techniques d'analyse
Publishing Information
- Journal Title
- Traitement Thermique
- Journal Issue
- no.275
- Journal Page Range
- p. 11-20.
- ISSN
- 0041-0950
- CODEN
- TRTHB5
INIS
- Country of Publication
- France
- Country of Input or Organization
- France
- INIS RN
- 26023544
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANGULAR DISTRIBUTION; AUGER ELECTRON SPECTROSCOPY; BACKSCATTERING; ELECTRON MICROPROBE ANALYSIS; ELECTRON MICROSCOPES; ELECTRONS; EMISSION SPECTROSCOPY; ENERGY-LOSS SPECTROSCOPY; INELASTIC SCATTERING; INTERACTIONS; ION BEAMS; ION SPECTROSCOPY; IONS; METALLOGRAPHY; RUTHERFORD SCATTERING; SECONDARY EMISSION; STOPPING POWER; TRANSMISSION ELECTRON MICROSCOPY; X-RAY EMISSION ANALYSIS; X-RAY SPECTROSCOPY
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; CHEMICAL ANALYSIS; DISTRIBUTION; ELASTIC SCATTERING; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELEMENTARY PARTICLES; EMISSION; FERMIONS; LEPTONS; MICROANALYSIS; MICROSCOPES; MICROSCOPY; NONDESTRUCTIVE ANALYSIS; SCATTERING; SPECTROSCOPY