Published 1990 | Version v1
Miscellaneous Metadata-only

Thin films characterization of titanium nitride produced by reactive sputtering

Creators

  • 1. Universidade Federal, Rio de Janeiro, RJ (Brazil). Coordenacao dos Programas de Pos-graduacao de Engenharia
  • 2. Pontificia Univ. Catolica do Rio de Janeiro, RJ (Brazil)

Description

Auger electron spectroscopy (AES), scanning electron microscopy in addition with Rutherford backscattering (RBS) and x-ray diffraction are used to characterize the composition, structure and morphology of the titanium nitride coatings deposited by reactive r.f. sputtering at room temperature. (author)

Availability note (English)

Available from the Library of Comissao Nacional de Energia Nuclear, RJ, Brazil.

Additional details

Additional titles

Original title (Portuguese)
Caracterizacao de filmes finos de nitreto de titanio produzidos por sputtering reativo

Publishing Information

Imprint Title
Proceedings of the 9. Brazilian Congress of Engineering and Material Science - v.1
Imprint Pagination
499 p.
Journal Page Range
p. 4-7.

Conference

Title
9. Brazilian Congress of Engineering and Material Science.
Dates
9-12 Dec 1990.
Place
Aguas de Sao Pedro, SP (Brazil).

INIS

Country of Publication
Brazil
Country of Input or Organization
Brazil
INIS RN
22057170
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference, Non-conventional Literature
Descriptors DEI
AUGER ELECTRON SPECTROSCOPY; RUTHERFORD SCATTERING; SCANNING ELECTRON MICROSCOPY; SPUTTERING; THIN FILMS; TITANIUM NITRIDES; X-RAY DIFFRACTION
Descriptors DEC
COHERENT SCATTERING; DIFFRACTION; ELASTIC SCATTERING; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; FILMS; MICROSCOPY; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SCATTERING; SPECTROSCOPY; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS

Optional Information

Notes
Imprint:Anais do 9. Congresso Brasileiro de Engenharia e Ciencia dos Materiais - v.1.