Published August 2003 | Version v1
Journal article Metadata-only

Simultaneous atomic force microscopy measurement of topography and contact resistance of metal films and carbon nanotubes

Creators

  • 1. Department of Physics and Astronomy, Department of Computer Science, and Curriculum in Applied and Materials Science, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599 (United States)
  • 2. Curriculum in Applied and Materials Science, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599 (United States)
  • 3. Department of Physics and Astronomy, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599 (United States)
  • 4. Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599 (United States)

Description

We present a quartz tuning-fork-based atomic force microscopy (AFM) setup that is capable of mapping the surface contact resistance while scanning topography. The tuning-fork setup allows us to use etched Pt/Ir tips, which have higher durability and better conductivity than probes used in earlier AFM conductance measurements. The performance of the method is demonstrated with contact resistance measurements of gold lines on silicon dioxide and carbon nanotubes on graphite

Additional details

Identifiers

DOI
10.1063/1.1590750;

Publishing Information

Journal Title
Review of Scientific Instruments
Journal Volume
74
Journal Issue
8
Journal Page Range
p. 3653-3655
ISSN
0034-6748
CODEN
RSINAK

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
35057568
Subject category
S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
Descriptors DEI
ATOMIC FORCE MICROSCOPY; CARBON; FILMS; GOLD; GRAPHITE; IRIDIUM; NANOTUBES; PERFORMANCE; PLATINUM; QUARTZ; SILICON OXIDES; SURFACES; TOPOGRAPHY
Descriptors DEC
CARBON; CHALCOGENIDES; ELEMENTS; METALS; MICROSCOPY; MINERALS; NANOSTRUCTURES; NONMETALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PLATINUM METALS; REFRACTORY METALS; SILICON COMPOUNDS; TRANSITION ELEMENTS

Optional Information

Notes
(c) 2003 American Institute of Physics.