X-ray analysis of film periodic compositions W/Si

Structure of tungsten films and W/Si multilayer compositions deposited by magnetron sputtering method was studied using X-ray diffraction. It was shown that chemical and phase composition of tungsten layers obtained under constant pressure of sputter gas approx 0.35 Pa was determined by deposition speed. Tungsten films produced with low deposition speed approx 0.2 nm/s contained up to approx 25 at % of carbon and oxygen admixtures. It was found that in compositions with periods about 10 nm and less, amorphous tungsten layers had short-range structure close to crystalline W3O. At W/Si interfaces,amorphous WSi2 occurs as a result of their interaction