On work function and characteristics of anomalous electrodeposited nickel-cobalt films
Creators
Description
The anomalous cobalt content in the electrodeposited nickel-cobalt (Ni-Co) alloy films significantly influenced by the current density was related to the variation of morphology and electron work function (EWF) of the films. The characteristics and EWF of Ni-Co films were investigated by scanning electron microscope with an attached energy dispersive X-ray spectrometer, X-ray diffraction, ultraviolet photoelectron spectroscopy (UPS) and Kelvin probe technique, respectively. As the current density increased from 1 to 20 ampere per square decimeter (A/dm2), the Co atomic concentration (at.%) in Ni-Co greatly decreased from 22.5 at.% to 13.2 at.% correspondingly. The surface morphology of film obtained at low current density became smoother than that at high current density. Both UPS and Kelvin probe results showed the same trend of EWF variation which increased with increasing current density from 1 to 10 A/dm2 and kept nearly unchanged at 10-20 A/dm2. The smooth Ni-Co film with low EWF could be achieved at low current density. In comparison, Kelvin probe operated at atmosphere ambient could be a good candidate for EWF measurement because of the lower cost and easier operation than UPS at ultra high vacuum.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2010.10.044Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2010.10.044;
- PII
- S0040-6090(10)01477-X;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 519
- Journal Issue
- 7
- Journal Page Range
- p. 2075-2078
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42072041
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- COBALT ALLOYS; CURRENT DENSITY; ELECTRODEPOSITION; MORPHOLOGY; NICKEL ALLOYS; PHOTOELECTRON SPECTROSCOPY; PROBES; SCANNING ELECTRON MICROSCOPY; SURFACES; THIN FILMS; ULTRAVIOLET SPECTRA; WORK FUNCTIONS; X-RAY DIFFRACTION; X-RAY SPECTROMETERS
- Descriptors DEC
- ALLOYS; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELECTROLYSIS; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; FILMS; FUNCTIONS; LYSIS; MEASURING INSTRUMENTS; MICROSCOPY; SCATTERING; SPECTRA; SPECTROMETERS; SPECTROSCOPY; SURFACE COATING; TRANSITION ELEMENT ALLOYS
Optional Information
- Copyright
- Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.