Published April 9, 2008 | Version v1
Journal article

Voltage-pulse-induced electromigration

  • 1. NTT Basic Research Laboratories, NTT Corporation, 3-1, Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198 (Japan)

Description

We propose and demonstrate a voltage-pulse-induced electromigration technique, in which electromigration in a gold nanowire is induced for a short period of about 10 μs by applying a voltage pulse. A local temperature analysis and a controlled electromigration experiment in the presence of voltage pulses indicate successful control of this voltage-pulsed-induced electromigration. We also measured the current-voltage characteristics of the nanowire after the application of each single voltage pulse to investigate the stochastic behavior of electromigration. A pulse duration shorter than the thermal relaxation time of the nanowire would allow us to separately control the local temperature and driving force for electromigration

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/19/14/145709

Additional details

Identifiers

DOI
10.1088/0957-4484/19/14/145709;
PII
S0957-4484(08)63718-6;

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
19
Journal Issue
14
Journal Page Range
[5 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
39108554
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S36: MATERIALS SCIENCE;
Descriptors DEI
ELECTRIC POTENTIAL; ELECTROPHORESIS; GOLD; NANOSTRUCTURES; PULSES; QUANTUM WIRES; RELAXATION TIME; STOCHASTIC PROCESSES; WIRES
Descriptors DEC
ELEMENTS; METALS; NANOSTRUCTURES; TRANSITION ELEMENTS