Published April 9, 2008
| Version v1
Journal article
Voltage-pulse-induced electromigration
Creators
- 1. NTT Basic Research Laboratories, NTT Corporation, 3-1, Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198 (Japan)
Description
We propose and demonstrate a voltage-pulse-induced electromigration technique, in which electromigration in a gold nanowire is induced for a short period of about 10 μs by applying a voltage pulse. A local temperature analysis and a controlled electromigration experiment in the presence of voltage pulses indicate successful control of this voltage-pulsed-induced electromigration. We also measured the current-voltage characteristics of the nanowire after the application of each single voltage pulse to investigate the stochastic behavior of electromigration. A pulse duration shorter than the thermal relaxation time of the nanowire would allow us to separately control the local temperature and driving force for electromigration
Availability note (English)
Available from http://dx.doi.org/10.1088/0957-4484/19/14/145709Additional details
Identifiers
- DOI
- 10.1088/0957-4484/19/14/145709;
- PII
- S0957-4484(08)63718-6;
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 19
- Journal Issue
- 14
- Journal Page Range
- [5 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39108554
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S36: MATERIALS SCIENCE;
- Descriptors DEI
- ELECTRIC POTENTIAL; ELECTROPHORESIS; GOLD; NANOSTRUCTURES; PULSES; QUANTUM WIRES; RELAXATION TIME; STOCHASTIC PROCESSES; WIRES
- Descriptors DEC
- ELEMENTS; METALS; NANOSTRUCTURES; TRANSITION ELEMENTS