Published August 6, 2001 | Version v1
Journal article Metadata-only

Selective-Resputtering-Induced Perpendicular Magnetic Anisotropy in Amorphous TbFe Films

Creators

Description

Perpendicular magnetic anisotropy energy in rf magnetron sputtered amorphous TbFe films is measured to increase exponentially with pair-order anisotropy induced by the selective resputtering of surface adatoms during film growth

Additional details

Identifiers

DOI
10.1103/PhysRevLett.87.067207;

Publishing Information

Journal Title
Physical Review Letters
Journal Volume
87
Journal Issue
6
Journal Page Range
p. 067207-067207.4
ISSN
0031-9007

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
32064310
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ANISOTROPY; BINDING ENERGY; IRON ALLOYS; MAGNETIC PROPERTIES; MAGNETRONS; TERBIUM ALLOYS
Descriptors DEC
ALLOYS; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ENERGY; EQUIPMENT; MICROWAVE EQUIPMENT; MICROWAVE TUBES; PHYSICAL PROPERTIES; RARE EARTH ALLOYS; TRANSITION ELEMENT ALLOYS

Optional Information

Notes
Othernumber: PRLTAO000087000006067207000001; 030132PRL
Funding organization
(US)