Development of a laboratory system hard X-ray photoelectron spectroscopy and its applications
- 1. Quantum Beam Science Directorate, Japan Atomic Energy Agency, Kouto 1-1-1, Sayo-cho, Sayo-gun, Hyogo 679-5148 (Japan)
- 2. Hiroshima Synchrotron Radiation Center, Hiroshima University, Kagamiyama 2-313, Higashi-Hiroshima, Hiroshima 739-0046 (Japan)
- 3. Synchrotron X-ray Beam Station at SPring-8, National Institute for Materials Science, Kouto 1-1-1, Sayo-cho, Sayo-gun, Hyogo 679-5148 (Japan)
- 4. Materials Analysis Station, National Institute for Materials Science Sengen 1-2-1, Tsukuba, Ibaraki 305-0047 (Japan)
Description
Highlights: •High Energy Angle Resolved Photoelectron spectroscopy system for laboratory use (HEARP Lab) with Cr Kα (5.4 keV) excitation was developed. •Basic performance of HEARP Lab has been estimated in comparison with that of typical beamline HXPES system. •Various applications including bulk valence band spectroscopy and buried layer analysis exemplify practical usefulness of HEARP Lab. •New methods including electric field application, high pressure photoelectron spectroscopy using environmental cell are introduced. •Several possible future developments are described. -- Abstract: Development of a laboratory hard X-ray photoelectron spectrometer using excitations by monochromatic Cr Kα X-rays of 5.4 keV and a high energy analyzer with a wide acceptance angle resolved objective lens is introduced. Wide applicability of the system as a powerful tool for the investigations of electronic and chemical states of materials are demonstrated by various examples including bulk sensitive valence band and core level spectroscopy, overlayer thickness determination by photoelectron take off angle dependence measurements, buried layer analysis, bulk sensitive photoelectron diffraction to determine surface polarity of compound single and poly crystalline films, interface state spectroscopy in MOS structures by applying voltage bias, and environmental cell for high pressure photoelectron spectroscopy. These results evidently show the laboratory HXPES system is going to be indispensable in wide varieties of targets. It also opens up opportunities of the analysis of materials which are not accessible to beamlines due to limitations by safety control regulation and avoidance of risks to the beamlines
Availability note (English)
Available from http://dx.doi.org/10.1016/j.elspec.2013.04.007Additional details
Identifiers
- DOI
- 10.1016/j.elspec.2013.04.007;
- PII
- S0368-2048(13)00070-4;
Publishing Information
- Journal Title
- Journal of Electron Spectroscopy and Related Phenomena
- Journal Volume
- 190
- Journal Issue
- Part B
- Journal Page Range
- p. 210-221
- ISSN
- 0368-2048
- CODEN
- JESRAW
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45050948
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CHEMICAL STATE; COMPARATIVE EVALUATIONS; ELECTRIC FIELDS; ELECTRIC POTENTIAL; EXCITATION; HARD X RADIATION; KEV RANGE 01-10; LABORATORY SYSTEM; LAYERS; MONOCHROMATIC RADIATION; PHOTOELECTRON SPECTROSCOPY; PRESSURE RANGE MEGA PA 10-100; SILICON OXIDES; THICKNESS; X-RAY SOURCES
- Descriptors DEC
- CHALCOGENIDES; DIMENSIONS; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; ENERGY RANGE; ENERGY-LEVEL TRANSITIONS; EVALUATION; IONIZING RADIATIONS; KEV RANGE; OXIDES; OXYGEN COMPOUNDS; PRESSURE RANGE; PRESSURE RANGE MEGA PA; RADIATION SOURCES; RADIATIONS; SILICON COMPOUNDS; SPECTROSCOPY; X RADIATION
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.