Published December 2021 | Version v1
Journal article

MD simulation of two-temperature model in ion irradiation of 3C-SiC: Effects of electronic and nuclear stopping coupling, ion energy and crystal orientation

  • 1. Laboratory of Micro/Nano Manufacturing Technology (MNMT-Dublin), University College Dublin (Ireland)
  • 2. State Key Laboratory of Precision Measuring Technology & Instruments, Laboratory of Micro/Nano Manufacturing Technology, Tianjin University (China)
  • 3. Department of Electrical and Electronic Engineering, Southern University of Science and Technology (China)
  • 4. Fraunhofer Institute for Integrated Systems and Device Technology IISB (Germany)
  • 5. Department of Physics, University of Helsinki (Finland)

Description

We present a numerical study on swift ion induced effects in crystalline 3C silicon carbide (SiC) by the two-temperature model, which considering the electronic stopping and electronic-phonon coupling effects simultaneously. Given the results of overlapping radiation, there is only a minority of defects formed in the system during the ionization dominance stage. When the incident energy is braked from 20 MeV to 500 keV by ionization after the first 0.91 ps, the system enters the nuclear stopping stage, the incident energy decreases to 50 keV in 0.44 ps, accomplished with a dramatic increase of damage. In addition, for the low-energy ion implantation process, the sparse atomic arrangement perpendicular to the implantation direction will reduce the response of the atomic subsystem. Insights into the complex correlations between electronic and atomic response may pave the way to elucidate the mechanism behind the experimentally observed defect formation and evolution under extreme energy deposition.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jnucmat.2021.153313

Additional details

Identifiers

DOI
10.1016/j.jnucmat.2021.153313;
PII
S0022311521005365;

Publishing Information

Journal Title
Journal of Nuclear Materials
Journal Volume
557
Journal Page Range
vp.
ISSN
0022-3115
CODEN
JNUMAM

Optional Information

Copyright
Copyright (c) 2021 Elsevier B.V. All rights reserved.