Published September 1, 2018 | Version v1
Journal article

Direct optical micropatterning of poly(dimethylsiloxane) for microfluidic devices

  • 1. Photonics Research Centre, Department of Electrical Engineering, The Hong Kong Polytechnic University, Hong Kong SAR (China)
  • 2. Department of Biomedical Engineering, The Chinese University of Hong Kong, Hong Kong SAR (China)

Description

Poly(dimethylsiloxane) (PDMS) is one of the most popular polymer materials for microfluidic devices. However, it still remains a challenge to rapidly fabricate PDMS microfluidic devices with micrometer-scale feature sizes. In this paper, we present gray-scale digital photolithography technology for direct patterning of large-area high-resolution PDMS microstructures for biomicrofluidic applications. With the positive- and negative-tone photosensitive PDMS (photoPDMS), we rapidly fabricated various PDMS microstructures with complex geometries by using a one-step patterning process. The positive-tone PDMS was used to pattern large-area microfluidic chips, while the negative-tone PDMS was utilized to fabricate high-resolution on-chip microstructures and components. In particular, a large-area microfluidic chip of 5.5  ×  2.8 cm2 with complex three-dimensional (3D) staggered herringbone mixers was fabricated from the positive-tone PDMS by using a single-step optical exposure process; a small microfluidic chip with a feature size as small as 5 µm was prepared with the negative-tone PDMS. Furthermore, 3D surface engineering of PDMS microchannels was demonstrated to customize extracellular microenvironments for investigating cell migration. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6439/aac44d

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Micromechanics and Microengineering (Print)
Journal Volume
28
Journal Issue
9
Journal Page Range
[9 p.]
ISSN
0960-1317
CODEN
JMMIEZ

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
51065754
Subject category
S42: ENGINEERING;
Descriptors DEI
ENGINEERING; GEOMETRY; MATERIALS; MICROSTRUCTURE; MIGRATION; MIXERS; POLYMERS; RESOLUTION; SURFACES
Descriptors DEC
EQUIPMENT; MATERIALS HANDLING EQUIPMENT; MATHEMATICS