Analytical solutions and particle simulations of cross-field plasma sheaths
Creators
- 1. Massachusetts Inst. of Tech., Cambridge, MA (USA). Plasma Fusion Center
- 2. California Univ., Berkeley, CA (USA). Electronics Research Lab.
Description
Particles simulations have been made of an infinite plasma slab, bounded by absorbing conducting walls, with a magnetic field parallel to the walls. The simulations have been either 1-D, or 2-D, with the magnetic field normal to the simulation plane. Initially, the plasma has a uniform density between the walls, and there is a uniform source of ions and electrons to replace particles lost to the walls. In the 1-D case, there is no diffusion of the particle guiding centers, and the plasma remains uniform in density and potential over most of the slab, with sheaths about a Debye length wide where the potential rises to the wall potential. In the 2-D case, the density profile becomes parabolic, going almost to zero at the walls, and there is a quasineutral presheath in the bulk of the plasma, in addition to sheaths near the walls. Analytic expressions are found for the density and potential profiles in both cases, including, in the 2-D case, the magnetic presheath due to finite ion Larmor radius, and the effects of the guiding center diffusion rate being either much less than or much grater than the energy diffusion rate. These analytic expressions are shown to agree with the simulations. A 1-D simulation with Monte Carlo guiding center diffusion included gives results that are good agreement with the much more expensive 2-D simulation. 17 refs., 10 figs
Availability note (English)
MF available from INIS under the Report Number; OSTI as DE91007306;NTIS;INIS; US Govt. Printing Office Dep.Files
22035912.pdf
Files
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Additional details
Publishing Information
- Imprint Pagination
- 42 p.
- Report number
- UCB/ERL-M--89/114
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 22035912
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ANALYTICAL SOLUTION; CROSSED FIELDS; DIFFUSION; DISTRIBUTION FUNCTIONS; MONTE CARLO METHOD; PLASMA DENSITY; PLASMA SHEATH; PLASMA SIMULATION
- Descriptors DEC
- SIMULATION
Optional Information
- Contract/Grant/Project number
- Contract FG03-86ER53220; AC02-78ET51013