Published May 2009 | Version v1
Journal article

A semi-fixed abrasive machining technique

  • 1. MOE Key Laboratory of Mechanical Manufacture and Automation, Zhejiang University of Technology, Hangzhou (China)
  • 2. National Engineering Research Center for High Efficiency Grinding, Changsha (China)

Description

This paper proposes the technique of semi-fixed abrasive machining to reduce or eliminate the surface defects caused by large abrasive grains and improve the efficiency of ultra-precision processing. The method of semi-fixed abrasive machining is described, and a semi-fixed abrasive plate (SFAP) is manufactured. Under the condition of adding or not adding large grains, experiments of semi-fixed and loose abrasive machining for a workpiece of damage-free single crystal silicon are carried out. The surface roughness and SEM micrograph of the workpieces demonstrate that semi-fixed abrasive machining leads to less surface defects, and the existence of large grains has a slight effect on the surface roughness of the workpiece. Single crystal silicon workpieces with a roughness (Ra) of about 0.2 µm are semi-fixed abrasive processed, in order to investigate the influence of load and rotating speed of the SFAP on the surface roughness and material removal rate. No significant variation of the surface roughness is observed when the value of the load or SFAP rotating speed changes, and the material removal rate increases with the increase of the load or SFAP rotating speed, i.e. the machining efficiency can be improved by increasing the load or SFAP rotating speed while the surface quality of the workpiece does not decrease

Availability note (English)

Available from http://dx.doi.org/10.1088/0960-1317/19/5/054006

Additional details

Identifiers

DOI
10.1088/0960-1317/19/5/054006;
PII
S0960-1317(09)95780-1;

Publishing Information

Journal Title
Journal of Micromechanics and Microengineering. Structures, Devices and Systems
Journal Volume
19
Journal Issue
5
Journal Page Range
[7 p.]
ISSN
0960-1317
CODEN
JMMIEZ

Conference

Title
1. international conference on nanomanufacturing
Acronym
NANOMAN 2008
Dates
13-16 Jul 2008
Place
Singapore (Singapore)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
44099414
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ABRASION; DAMAGE; DEFECTS; EFFICIENCY; MACHINING; MONOCRYSTALS; ROUGHNESS; SCANNING ELECTRON MICROSCOPY; SILICON; SURFACES; VELOCITY
Descriptors DEC
CRYSTALS; ELECTRON MICROSCOPY; ELEMENTS; MICROSCOPY; SEMIMETALS; SURFACE PROPERTIES