A semi-fixed abrasive machining technique
- 1. MOE Key Laboratory of Mechanical Manufacture and Automation, Zhejiang University of Technology, Hangzhou (China)
- 2. National Engineering Research Center for High Efficiency Grinding, Changsha (China)
Description
This paper proposes the technique of semi-fixed abrasive machining to reduce or eliminate the surface defects caused by large abrasive grains and improve the efficiency of ultra-precision processing. The method of semi-fixed abrasive machining is described, and a semi-fixed abrasive plate (SFAP) is manufactured. Under the condition of adding or not adding large grains, experiments of semi-fixed and loose abrasive machining for a workpiece of damage-free single crystal silicon are carried out. The surface roughness and SEM micrograph of the workpieces demonstrate that semi-fixed abrasive machining leads to less surface defects, and the existence of large grains has a slight effect on the surface roughness of the workpiece. Single crystal silicon workpieces with a roughness (Ra) of about 0.2 µm are semi-fixed abrasive processed, in order to investigate the influence of load and rotating speed of the SFAP on the surface roughness and material removal rate. No significant variation of the surface roughness is observed when the value of the load or SFAP rotating speed changes, and the material removal rate increases with the increase of the load or SFAP rotating speed, i.e. the machining efficiency can be improved by increasing the load or SFAP rotating speed while the surface quality of the workpiece does not decrease
Availability note (English)
Available from http://dx.doi.org/10.1088/0960-1317/19/5/054006Additional details
Identifiers
- DOI
- 10.1088/0960-1317/19/5/054006;
- PII
- S0960-1317(09)95780-1;
Publishing Information
- Journal Title
- Journal of Micromechanics and Microengineering. Structures, Devices and Systems
- Journal Volume
- 19
- Journal Issue
- 5
- Journal Page Range
- [7 p.]
- ISSN
- 0960-1317
- CODEN
- JMMIEZ
Conference
- Title
- 1. international conference on nanomanufacturing
- Acronym
- NANOMAN 2008
- Dates
- 13-16 Jul 2008
- Place
- Singapore (Singapore)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44099414
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ABRASION; DAMAGE; DEFECTS; EFFICIENCY; MACHINING; MONOCRYSTALS; ROUGHNESS; SCANNING ELECTRON MICROSCOPY; SILICON; SURFACES; VELOCITY
- Descriptors DEC
- CRYSTALS; ELECTRON MICROSCOPY; ELEMENTS; MICROSCOPY; SEMIMETALS; SURFACE PROPERTIES