Published June 2, 2014 | Version v1
Journal article

Growth of graphene from SiC{0001} surfaces and its mechanisms

  • 1. Department of Applied Chemistry, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya-shi, Aichi-ken, 464-8603 (Japan)
  • 2. EcoTopia Science Institute, Nagoya University, Furo-cho, Chikusa-ku, Nagoya-shi, Aichi-ken, 464-8603 (Japan)

Description

Graphene, a one-atom-layer carbon material, can be grown by thermal decomposition of SiC. On Si-terminated SiC(0001), graphene nucleates at steps and grows layer-by-layer, and as a result a homogeneous monolayer or bilayer can be obtained. We demonstrate this mechanism both experimentally and theoretically. On the C-face (000 1-bar ), multilayer graphene nucleates not only at steps, but also on the terraces. These differences reflect the distinct differences in the reactivity of these faces. Due to its high quality and structural controllability, graphene on SiC{0001} surfaces will be a platform for high-speed graphene device applications. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0268-1242/29/6/064009

Additional details

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
29
Journal Issue
6
Journal Page Range
[11 p.]
ISSN
0268-1242
CODEN
SSTEET

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46083627
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ATOMS; CRYSTAL GROWTH; CRYSTAL STRUCTURE; GRAPHENE; LAYERS; PYROLYSIS; REACTIVITY; SILICON CARBIDES; SURFACES; VELOCITY
Descriptors DEC
CARBIDES; CARBON; CARBON COMPOUNDS; CHEMICAL REACTIONS; DECOMPOSITION; ELEMENTS; NONMETALS; SILICON COMPOUNDS; THERMOCHEMICAL PROCESSES