Published 2008
| Version v1
Miscellaneous
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Effect of the hydrogen and argon ion-beam treatment on the structural and electrical properties of Cz Si wafers: comparative study
Creators
- 1. Belarusian State University, Minsk (Belarus)
- 2. Lublin University of Technology, Lublin (Poland)
Description
no abstract available
Files
40107945.pdf
Files
(40.0 kB)
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Additional details
Publishing Information
- Publisher
- Maria Curie-Sklodowska University, Lublin
- Imprint Place
- Lublin (Poland)
- Imprint Title
- Programme and abstracts of the seventh International Conference on Ion Implantation and other Applications of Ions and Electrons (ION 2008)
- Imprint Pagination
- 186 p.
- Journal Page Range
- p. 73
- Report number
- INIS-PL--2009-0011
Conference
- Title
- 7. International Conference on Ion Implantation and other Applications of Ions and Electrons
- Acronym
- ION 2008
- Dates
- 16-19 Jun 2008
- Place
- Kazimierz Dolny (Poland)
INIS
- Country of Publication
- Poland
- Country of Input or Organization
- Poland
- INIS RN
- 40107945
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- No Abstract, Conference
- Descriptors DEI
- ARGON IONS; HYDROGEN IONS; ION BEAMS; OXIDES; SEMICONDUCTOR MATERIALS; SURFACE PROPERTIES
- Descriptors DEC
- BEAMS; CHALCOGENIDES; CHARGED PARTICLES; IONS; MATERIALS; OXYGEN COMPOUNDS