Published July 1, 1999
| Version v1
Report
Multilayer coated optics for an alpha-class extreme ultraviolet lithography system
Description
no abstract available
Availability note (English)
Available from (additional information): www.als.lbl.gov/Additional details
Publishing Information
- Imprint Pagination
- [vp.]
- Report number
- LBNL/ALS--1519
Conference
- Title
- SPIE Conference
- Dates
- 21-23 Jul 1999
- Place
- Denver, CO (United States)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 33061141
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S42: ENGINEERING;
- Resource subtype / Literary indicator
- No Abstract, Conference, Non-conventional Literature
- Descriptors DEI
- COATINGS; EXTREME ULTRAVIOLET RADIATION; INTEGRATED CIRCUITS; LAYERS; OPTICS
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; ELECTRONIC CIRCUITS; MICROELECTRONIC CIRCUITS; RADIATIONS; ULTRAVIOLET RADIATION
Optional Information
- Contract/Grant/Project number
- AC03-76SF00098
- Funding organization
- US Department of Energy (United States)