Published 1989
| Version v1
Book
Effect of oxygen ion implantation through TiO induced by implantation on rutile formation
- 1. Saitama Inst. of Tech., Okabe (Japan)
Description
Published in summary form only
Additional details
Additional titles
- Original title (no language)
- Dai-12-kai ion kogaku shinpojiumu, iongen to ion wo kiso toshita oyo gijutsu.
Publishing Information
- Publisher
- Kyoto Univ., Research Group of Ion Engineering in Ion Beam Engineering Experimental Lab.
- Imprint Place
- Kyoto (Japan)
- Imprint Title
- Proceedings of the twelfth symposium on ion sources and ion-assisted technology
- Imprint Pagination
- 665 p.
- Journal Page Range
- p. 507-510.
Conference
- Title
- 12. symposium on ion sources and ion-assisted technology.
- Dates
- 5-7 Jun 1989.
- Place
- Tokyo (Japan).
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 21033213
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference, No Abstract
- Descriptors DEI
- DEPOSITION; DEPTH; ION IMPLANTATION; OXYGEN IONS; RUTILE; SPUTTERING; SURFACES; TITANIUM OXIDES; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; CHARGED PARTICLES; COHERENT SCATTERING; DIFFRACTION; DIMENSIONS; IONS; MATERIALS; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; RADIOACTIVE MATERIALS; RADIOACTIVE MINERALS; SCATTERING; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- Imprint:Dai-12-kai ion kogaku shinpojiumu, iongen to ion wo kiso toshita oyo gijutsu.